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The Applied Materials P5000 PECVD system is a multi-chamber Plasma Enhanced Chemical Vapor Deposition tool with standard operating temperatures of 200-400C.Chamber A is configured for highly conformal TEOS (SiO 2) film deposition, but is not available for processing at this time. APPLIED MATERIALS AMAT P5000 MARK II SYSTEM AMAT P5000 Mark II Hybrid System. Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel. Integrated endpoint system with 2 monochromators. Currently configured for 100mm wafers. System is fully configurable to your specifications.
Amat P5000 Cvd
The Applied Materials P5000 PECVD system is a multi-chamber Plasma Enhanced Chemical Vapor Deposition tool with standard operating temperatures of 200-400C. Chamber A is configured for highly conformal TEOS (SiO 2) film deposition, but is not available for processing at this time. Details about AMAT Applied Materials Precision 5000 Nitride PARC PECVD System P5000 Be the first to write a review. AMAT Applied Materials Precision 5000 Nitride PARC PECVD System P5000. AMAT Applied Materials 4347 B 5000 CVD Chamber 200mm Precision 5000 P5000 Used. Free shipping.